Hydrogen Silsesquioxane Electron-Beam Resist

نشر بتاريخ 2026-09-11 09:30:29

700

Our hydrogen silsesquioxane electron-beam resist, H-SiQ, is a negative-tone resist developed for electron beam lithography applications. At DisChem, we formulate H-SiQ from dry silica resin in a semiconductor-grade MIBK carrier solvent. It is designed for direct-write thin-film EBL applications and is characterized by pitch resolution, sensitivity, and etch resistance. We provide H-SiQ as a specialized resist option for customers working with advanced micro- and nanofabrication processes.

الرجاء تسجيل الدخول , للأعجاب والمشاركة والتعليق على هذا!

إضافة مقال

الألعاب

U4GM: Win the Tycoon Racers Event in Monopoly Go

Tycoon Racers is one of the most exciting limited-time events in Monopoly GO. Unlike standard...

بواسطة 2026-06-06 01:44:35 0 901

الألعاب

RF Online Next Chapter 10 Update: Core World, Tempest MAU and Diamond Economy

RF Online Next is entering a major new phase just weeks after its global launch. Chapter 10...

بواسطة 2026-08-11 11:46:17 0 799

أخرى

Robotic Sensors Market Outlook Signals USD 3.33 Billion by 2028 as Asia-Pacific Accelerates Industrial Robot Adoption

Market Overview and Growth Outlook The global Robotic Sensors Market was valued at USD 1.94...

بواسطة 2026-10-15 13:13:03 0 449

Networking

Sink Cutout Machines Market to Reach USD 1,615.7 million by 2036

According to Future Market Insights (FMI), the global sink cutout machines market is...

بواسطة 2026-09-04 19:36:16 0 566

Networking

Soft Starter Systems Market to Reach USD 5.6 Billion by 2036

According to Future Market Insights (FMI), the Soft Starter Systems Market is set for...

بواسطة 2026-09-09 20:44:55 0 400