Dischem Inc

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2026-07-14 05:10:21 -

Sulfamate Nickel Plating Solution
For high-precision electroforming, our E-Form sulfamate nickel plating solution is the industry standard. At DisChem, we manufacture our plating chemistries under strict quality controls to ensure ultra-low internal stress and exceptional ductility. Whether you are replicating optical media, fabricating micro-devices, or creating complex molds, our sulfamate nickel plating solution guarantees a...

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2026-07-14 05:10:08 -

Direct Write Electron Beam Lithography
Are you pushing the limits of nanoscale fabrication? Our advanced chemical solutions at DisChem are meticulously engineered to support direct write electron beam lithography processes. This maskless patterning technique requires absolute accuracy, and we provide the critical adhesion promoters and anti-charging agents needed to maintain beam stability. By optimizing your direct write electron...

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2026-07-14 05:09:55 -

Hydrogen Silsesquioxane Electron-Beam Resist
At DisChem, we offer high-performance hydrogen silsesquioxane electron-beam resist solutions, such as our premium H-SiQ resist. Specially formulated for high-resolution nanolithography, this negative-tone resist delivers unmatched pattern fidelity for features down to the sub-10 nm range. By choosing our hydrogen silsesquioxane electron-beam resist, you ensure your advanced semiconductor...

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