E-Beam Lithography Charge Dissipation Agent

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2026-08-13 06:36:04 -

Our E-Beam Lithography Charge Dissipation Agent, DisCharge H2O, helps address charge accumulation when electron beam lithography is performed on electrically insulating substrates. We developed this water-based material to create a conductive layer over the resist, helping accumulated electrons dissipate during exposure. This can support improved pattern fidelity and positional accuracy....

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