Our SurPass photoresist adhesion promoter is designed to support resist adhesion and coating quality across a broad range of substrate materials used in photon and electron beam lithography. At DisChem, we offer SurPass cationic adhesion promoters and priming agents as part of our microlithography chemistry portfolio. With waterborne formulations available, we give process engineers a practical option for improving resist adhesion while maintaining a focused approach to advanced lithographic manufacturing and microfabrication requirements.
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