Our E-Beam Lithography Charge Dissipation Agent, DisCharge H2O, helps address charge accumulation when electron beam lithography is performed on electrically insulating substrates. We developed this water-based material to create a conductive layer over the resist, helping accumulated electrons dissipate during exposure. This can support improved pattern fidelity and positional accuracy. DisCharge H2O is compatible with several commonly used EBL resist systems and can be removed conveniently with water or IPA.
English
Arabic
French
Spanish
Portuguese
Deutsch
Turkish
Dutch
Russian
Romaian
Portuguese (Brazil)
Greek
