At DisChem, our electron beam anti-charge agent solutions help address charge accumulation on electrically insulated substrates during electron beam lithography. Our DisCharge chemistry is specifically developed for this purpose, supporting more controlled EBL processing. We understand that charging can affect demanding lithography applications, so we focus on specialized chemistry for micro- and nanofabrication. If you need an electron beam anti-charge agent for your process, we provide focused solutions backed by technical expertise.
Arabic
French
Spanish
Portuguese
Deutsch
Turkish
Dutch
Italiano
Russian
Romaian
Portuguese (Brazil)
Greek
